Characterization of high temperature deposited Ti-contalning hydrogenated carbon thin films

Journal of Applied Physics

Volumn 96, Issue 12, 2004, Pages 7705-7713

  Shi, B ^a   Meng, W J ^a   Evans, R D ^b,c  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b TIMKEN COMPANY   (United States)

^c Case Western Reserve University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MECHANICAL CHARACTERISTICS; MECHANICAL CHARACTERIZATION; TIC PRECIPITATION; TRIBOLOGICAL PROPERTIES;

AMORPHOUS MATERIALS; ANNEALING; CHEMICAL VAPOR DEPOSITION; COMPOSITION; DEPOSITION; ELECTRON MICROSCOPY; HEAT TREATMENT; HIGH TEMPERATURE EFFECTS; HYDROGENATION; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; PRECIPITATION (CHEMICAL); RAMAN SPECTROSCOPY; TITANIUM; TRIBOLOGY;

THIN FILMS;

EID: 11044231777     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1812825     Document Type: Article

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