Probing Ge segregation in NiSi1-uGeu using micro-raman spectroscopy

Electrochemical and Solid-State Letters

Volumn 7, Issue 12, 2004, Pages

  Tao, H B ^a   Tripathy, S ^a   Chi, D Z ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; MOLECULAR VIBRATIONS; MORPHOLOGY; OXIDES; PLATINUM; RAMAN SCATTERING; RAMAN SPECTROSCOPY; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SEGREGATION (METALLOGRAPHY); TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

MICRO=RAMAN SPECTROSCOPY; RAMAN ANALYSES; SEGREGATION EFFECTS; SOLID-STATE REACTIONS;

NICKEL ALLOYS;

EID: 10944257484     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1813271     Document Type: Article

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