Two-axis single-crystal silicon micromirror arrays

Journal of Microelectromechanical Systems

Volumn 13, Issue 6, 2004, Pages 1006-1017

  Dokmeci, Mehmet R ^a   Pareek, Ajay ^b   Bakshi, Shivalik ^b   Waelti, Marc ^b,c   Fung, Clifford D ^b   Heng, Khee Hang ^b   Mastrangelo, Carlos H ^b  

^a Northeastern University   (United States)

^b Corning IntelliSense ^*  (United States)

^c Phonak AG   (Switzerland)

Author keywords

Al etching; Deep reactive ion etching (DRIE); Micromirrors; Optical switching; Silicon on insulator (SOI) wafers

Indexed keywords

ELECTRODES; ELECTROSTATIC ACTUATORS; OPTICAL DESIGN; REACTIVE ION ETCHING; RESIDUAL STRESSES; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE TESTING; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; SINGLE CRYSTALS; SWITCHING SYSTEMS; THERMAL STRESS;

ALUMINUM ETCHING; DEEP REACTIVE ION ETCHING (DRIE); MICROMIRRORS; OPTICAL SWITCHING;

MIRRORS;

EID: 10944233927     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2004.839812     Document Type: Article

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