Stranski-Krastanov growth of tungsten during chemical vapor deposition revealed by micro-auger electron spectroscopy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 10, 2004, Pages 6974-6977

  Noda, Suguru ^a   Tsumura, Takeshi ^a   Fukuhara, Jota ^b   Yoda, Takashi ^b   Komiyama, Hiroshi ^a   Shimogaki, Yukihiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Chemical vapor deposition; Micro auger electron spectroscopy; Nucleation and growth; Stranski Krastanov growth; Titanium nitride; Tungsten

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; INTEGRATED CIRCUITS; MONOLAYERS; NUCLEATION; REDUCTION; TITANIUM NITRIDE; TUNGSTEN;

MICRO-AUGER ELECTRON MICROSCOPY; NUCLEATION AND GROWTH; STRANSKI-KRASTANOV GROWTH; SURFACE ELEMENTAL ANALYSIS;

CHEMICAL VAPOR DEPOSITION;

EID: 10844297909     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.6974     Document Type: Article

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