Dependence of NO2 gas sensitivity of WO3 sputtered films on film density

Thin Solid Films

Volumn 474, Issue 1-2, 2005, Pages 255-260

  Jin, Cheng Ji ^a   Yamazaki, Toshinari ^a   Shirai, Yashuyoshi ^a   Yoshizawa, Toshio ^a   Kikuta, Toshio ^a   Nakatani, Noriyuki ^a   Takeda, Humio ^b  

^a UNIVERSITY OF TOYAMA   (Japan)

^b TOYAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Nitrogen dioxide; Sensors; Sputtering; Tungsten oxide

Indexed keywords

AGGLOMERATION; ATOMIC FORCE MICROSCOPY; CHEMICAL SENSORS; CONCENTRATION (PROCESS); DOPING (ADDITIVES); NITROGEN OXIDES; QUARTZ; SPUTTERING; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION;

BULK DENSITY; FILM DENSITY; GAS SENSITIVITY; VOIDS;

THIN FILMS;

EID: 10844274747     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.09.009     Document Type: Article

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