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EPJ Applied Physics

Volumn 28, Issue 3, 2004, Pages 343-346

Control and monitoring of optical thin films deposition in a matrix distributed electron cyclotron resonance reactor

(6) Daineka, D a Kouznetsov, D a Bulkin, P a Girard, G a Bouree J E a Drevillon B a

a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES (France)

Author keywords

[No Author keywords available]

Indexed keywords

COATING TECHNIQUES; CONTROL SYSTEMS; ELECTRON CYCLOTRON RESONANCE; ELLIPSOMETRY; EPITAXIAL GROWTH; FILM GROWTH; PROCESS CONTROL; REFRACTIVE INDEX; SILICON; STOICHIOMETRY; THIN FILMS;

MATRIX DISTRIBUTED ELECTRON CYCLOTRON RESONANCE (MDECR) REACTORS; OPTICAL THIN FILMS; SPECTROSCOPIC ELLIPSOMETRY (SE);

OPTICAL FILMS;

EID: 10844247228 PISSN: 12860042 EISSN: None Source Type: Journal
DOI: 10.1051/epjap:2004198 Document Type: Article

Times cited : (2)

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