Matrix distributed ECR-PECVD for high rate deposition of silica for applications in integrated optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4944, Issue , 2002, Pages 62-71

  Girard, Gregory ^a   Daineka, Dmitri ^a   Bulkin, Pavel ^a   Bouree, Jean Eric ^a  

^a ECOLE POLYTECHNIQUE   (France)

Author keywords

ECR PECVD; Ellipsometry; Optical thin films; Silica deposition

Indexed keywords

COMPOSITION; ELECTRON CYCLOTRON RESONANCE; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN; OPTICAL PROPERTIES; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILANES; SILICA; THIN FILMS;

SILICA FILMS; ULTRAVIOLET VISIBLE ELLIPSOMETRY;

INTEGRATED OPTICS;

EID: 0042063748     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468294     Document Type: Conference Paper

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