Aerial image characterization for defects in an extreme-ultraviolet mask

Journal of the Korean Physical Society

Volumn 45, Issue 5 II, 2004, Pages 1218-1223

  Yoo, Myoung Sul ^a   Park, Seung Wook ^a   Kim, Ok Kyung ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Aerial image; EUV lithography; EUV mask; FDTD (finite difference time domain); Multilayer defect

Indexed keywords

EID: 10444247348     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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