Electron-cyclotron-resonance sputtering apparatus for multilayered optical bandpass filters applicable to wavelength division multiplexing

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2431-2436

  Jin, Yoshito ^a   Shimada, Masaru ^a   Ono, Toshiro ^a,b  

^a NTT CORPORATION   (Japan)

^b HIROSAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; MULTILAYERS; OPTICAL FILTERS; PLASMAS; REFRACTIVE INDEX; SILICA; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TANTALUM COMPOUNDS; WAVELENGTH DIVISION MULTIPLEXING;

GLASS SUBSTRATE; MULTILAYERED STRUCTURES; SURFACE SMOOTHNESS;

BANDPASS FILTERS;

EID: 10244263533     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1809128     Document Type: Article

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