Ultrathin Al2O3 and AlN films deposited by reactive sputter using advanced electron cyclotron resonance plasma source

Vacuum

Volumn 59, Issue 2-3, 2000, Pages 727-734

  Shimada, M ^a   Amazawa, T ^a   Ono, T ^a   Matsuo, S ^a   Oikawa, H ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005911924     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00340-7     Document Type: Article

References (11)

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