Material properties of ion beam deposited oxides for the optoelectronic industry

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 1135-1140

  Devasahayam, Adrian J ^a   Agatic, Ivo ^a   Druz, Boris ^a   Hegde, Hari ^a   Zaritsky, Isaac ^a   Das, Suhit R ^b   Boudreau, Marcel ^b   Yin, Tao ^b   Mallard, Robert ^b   Laframboise, Sylvain ^b  

^a VEECO INSTRUMENTS INC   (United States)

^b NORTEL NETWORKS   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANTIREFLECTION COATINGS; COMPRESSIVE STRESS; ION BEAMS; LIGHT ABSORPTION; OPTOELECTRONIC DEVICES; REFRACTIVE INDEX; SILICA; TANTALUM COMPOUNDS; TENSILE STRESS; THERMODYNAMIC STABILITY; TITANIUM DIOXIDE;

DEKTAK SURFACE PROFILOMETER; FILM STRESS; FILM THICKNESS; ION BEAM DEPOSITION; MACH-ZEHNDER OPTICAL MODULATOR;

THIN FILMS;

EID: 0036564796     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1463077     Document Type: Article

References (10)