Ultrathin oxide films deposited using electron cyclotron resonance sputter

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 5, 1999, Pages 2222-2225

  Amazawa, Takao ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22844456481     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590897     Document Type: Article

References (2)

1. S. Matsuo and M. Kiuchi, Jpn. J. Appl. Phys., Part 2 22, L210 (1983).
2. T. Ono, C. Takahashi, and S. Matsuo, Jpn. J. Appl. Phys., Part 2 23, L534 (1984).