Etching with electron beam generated plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2276-2283

  Leonhardt, D ^a   Walton, S G ^a   Muratore, C ^a   Fernsler, R F ^a   Meger, R A ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; GRAPHITIZATION; MICROELECTROMECHANICAL DEVICES; PASSIVATION; PHOTORESISTS; PLASMA DENSITY; PLASMAS; SILICON; SUBSTRATES; SULFUR COMPOUNDS;

ELECTRON BEAM MODULATION; ELECTRON ENERGY DISTRIBUTION; ETCH RATES; LARGE AREA PLASMA PROCESSING SYSTEMS (LAPPS);

DRY ETCHING;

EID: 10244235299     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1795827     Document Type: Article

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