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Volumn 20, Issue 3, 2002, Pages 983-985
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Low temperature SF6/O2 electron cyclotron resonance plasma etching for polysilicon gates
a a a a |
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Author keywords
[No Author keywords available]
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Indexed keywords
ADDITION REACTIONS;
ANISOTROPY;
ELECTRON CYCLOTRON RESONANCE;
LOW TEMPERATURE OPERATIONS;
OXYGEN;
PASSIVATION;
PHOTORESISTS;
PLASMA ETCHING;
SCANNING ELECTRON MICROSCOPY;
SULFUR COMPOUNDS;
THERMAL EFFECTS;
ANISOTROPIC ETCHING;
GATE OXIDE;
POLYSILICON GATES;
SIDEWALL ANGLE;
POLYSILICON;
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EID: 0036565348
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1472426 Document Type: Article |
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Times cited : (4)
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References (10)
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