Effect of silicon substrate microroughness on gate oxide quality

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 5, 1996, Pages 3299-3304

  Hegde, Rama I ^a   Chonko, Mark A ^a   Tobin, Philip J ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010226071     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588823     Document Type: Article

References (16)

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