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Volumn 573, Issue 2, 2004, Pages
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Imprinting Br-atoms at Si(1 1 1) from a SAM of CH3Br(ad), with pattern retention
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Author keywords
Bromine; Chemisorption; Photochemistry; Physical adsorption; Scanning tunneling microscopy; Self assembly; Silicon; Surface chemical reaction
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Indexed keywords
ABSORPTION;
BROMINE;
BROMINE COMPOUNDS;
CHARGE TRANSFER;
CHEMICAL BONDS;
CHEMISORPTION;
MOLECULAR DYNAMICS;
PHOTOCHEMICAL REACTIONS;
SCANNING TUNNELING MICROSCOPY;
SILICON;
SURFACE REACTIONS;
METHYL BROMIDE;
PATTERN RETENTION;
PHYSICAL ADSORPTION;
SURFACE CHEMICAL REACTIONS;
SELF ASSEMBLY;
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EID: 10044258825
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/j.susc.2004.09.048 Document Type: Article |
Times cited : (29)
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References (32)
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