Imprinting Br-atoms at Si(1 1 1) from a SAM of CH3Br(ad), with pattern retention

Surface Science

Volumn 573, Issue 2, 2004, Pages

  Dobrin, Sergey ^a   Lu, Xuekun ^a   Naumkin, Fedor Y ^a   Polanyi, John C ^a   Yang, Jody ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

Bromine; Chemisorption; Photochemistry; Physical adsorption; Scanning tunneling microscopy; Self assembly; Silicon; Surface chemical reaction

Indexed keywords

ABSORPTION; BROMINE; BROMINE COMPOUNDS; CHARGE TRANSFER; CHEMICAL BONDS; CHEMISORPTION; MOLECULAR DYNAMICS; PHOTOCHEMICAL REACTIONS; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACE REACTIONS;

METHYL BROMIDE; PATTERN RETENTION; PHYSICAL ADSORPTION; SURFACE CHEMICAL REACTIONS;

SELF ASSEMBLY;

EID: 10044258825     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.09.048     Document Type: Article

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