Development of a high average power extreme ultraviolet electric capillary discharge source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 226-231

  Fornaciari, Neal R ^a   Bender, Howard ^a   Buchenauer, Dean ^a   Kanouff, Mike ^a   Karim, Steve ^a   Kubiak, Glenn D ^a   Moen, Chris ^a   Shimkaveg, Greg ^b   Silfvast, William T ^b   Stewart, Kenneth D ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

Capillary discharge source; EUV source; EUVL; Plasma discharge source

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC DISCHARGES; ELECTRODES; MULTILAYERS; ULTRAVIOLET RADIATION;

CAPILLARY DISCHARGE SOURCES; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

LITHOGRAPHY;

EID: 17944369237     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436652     Document Type: Article

References (4)

1. Extreme ultraviolet sources for lithography applications
2. High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography
3. Intense xenon capillary discharge extreme ultraviolet source in the 10-16 nm wavelength region
4. Development of an electric capillary discharge source