Nozzle-nanostructure fabrication on glass capillary by focused-ion-beam chemical vapor deposition and etching

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 4107-4110

  Kometani, Reo ^a,d   Morita, Takahiko ^a,d   Watanabe, Keiichiro ^a,d   Kanda, Kazuhiro ^a,d   Haruyama, Yuichi ^a,d   Kaito, Takashi ^b   Fujita, Junichi ^c,d   Ishida, Masahiko ^c,d   Ochiai, Yukinori ^c,d   Matsui, Shinji ^a,d  

^a UNIVERSITY OF HYOGO   (Japan)

^b SEIKO INSTRUMENTS INC   (Japan)

^c NEC CORPORATION   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Bio injector; Chemical vapor deposition (CVD); Focused ion beam (FIB); Glass capillary; Nozzle nanostructure

Indexed keywords

CAPILLARITY; CHEMICAL VAPOR DEPOSITION; ETCHING; ION BEAMS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; SEMICONDUCTING GLASS;

GLASS CAPILLARIES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 12444347538     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4107     Document Type: Conference Paper

References (2)

1. S. Matsui, T. Kaito, J. Fujita, M. Komuro, K. Kanda and Y. Haruyama: J. Vac. Sci. & Technol. B 18 (2000) 3181.
2. J. Fujita, M. Ishida, T. Sakamoto, Y. Ochia, T. Kaito and S. Matsui: J. Vac. Sci. & Technol. B 19 (2001) 2834.