Approach to critical dimension error budget analysis and specification estimation by the Monte Carlo method

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 3120-3123

  Lee, Sung Woo ^a   Yeo, Gi Sung ^a   Lee, Jung Hyeon ^a   Cho, Han Ku ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATION; COMPUTER SIMULATION; IMAGE ANALYSIS; LITHOGRAPHY; MASKS; MONTE CARLO METHODS;

CRITICAL DIMENSION (CD); MASK TRANSMITTANCE;

SEMICONDUCTOR DEVICES;

EID: 0942267515     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1622945     Document Type: Conference Paper

References (9)

1. T. M. Jeong et al., Jpn. J. Appl. Phys., Part 1 41, 5113 (2002).
2. R. L. Kostelak, E. L. Raab, and S. Vaidya, J. Vac. Sci. Technol. B 12, 3793 (1994).
3. Y. C. Kim, G. Vandenberghe, S. Verhaegen, and K. Ronse, Proc. SPIE 4562, 954 (2002).
4. S. Y. Zinn, S. W. Lee, S. W. Choi, and J. M. Sohn, J. Vac. Sci. Technol. B 20, 2606 (2002).
5. S. W. Lee, I. S. Kim, J. H. Lee, H. K. Cho, and W. S. Han, Proc. SPIE 4889, 209 (2002).
6. B. J. Lin, Jpn. J. Appl. Phys., Part 1 33, 6756 (1994).
7. H. Kanemitsu, K. Nagai, M. Asano, and T. Sutani, Proc. SPIE 4066, 47 (2000).
8. D. S. Nam, E. M. Lee, S. G. Jung, Y. S. Kang, G. S. Yeo, J. H. Lee, H. K. Cho, W. S. Han, and J. T. Moon, Proc. SPIE 4691, 57 (2002).
9. T. Terasawa and N. Hasegawa, Jpn. J. Appl. Phys., Part 1 39, 6786 (2000).