Comprehensive approach to determining the specification for mask mean to target

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 209-220

  Lee, Sung Woo ^a   Kim, In Sung ^a   Lee, Jung Hyeon ^a   Cho, Han Ku ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

ArF; Exposure latitude; MEEF; MTT; Uniformity

Indexed keywords

COMPUTER SIMULATION; ERROR ANALYSIS; PHOTOLITHOGRAPHY; TARGETS;

PATTERN DENSITY;

MASKS;

EID: 0037627744     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467479     Document Type: Conference Paper

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