Flare in microlithographic exposure tools

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 8, 2002, Pages 5113-5119

  Jeong, Tae Moon ^a   Choi, Sung Woon ^a   Park, Jong Rak ^a   Ki, Won Tai ^a   Sohn, Jung Min ^a   Lee, Sung Woo ^a   Kang, Hyun Jae ^a   Woo, Sang Gyun ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Flare; In field uniformity; Linewidth variation; Lithography; Modified aerial image; Photomask

Indexed keywords

IMAGE PROCESSING; MASKS; MICROELECTRONICS; OPTICAL DEVICES; OPTICAL INSTRUMENT LENSES;

FLARE; LINEWIDTH VARIATION;

PHOTOLITHOGRAPHY;

EID: 0036697480     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.5113     Document Type: Article

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