Microstructure/dielectric property relationship of low temperature synthesised (Na,K)NbOx thin films

Journal of Crystal Growth

Volumn 262, Issue 1-4, 2004, Pages 322-326

  Kugler, Veronika M ^a   Söderlind, Fredrik ^a   Music, Denis ^a   Helmersson, Ulf ^a   Andreasson, Johanna ^b   Lindbäck, Ture ^b  

^a LINKÖPING UNIVERSITY   (Sweden)

^b LULEÅ UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

A1. Characterization; A3. Physical vapor deposition processes; B1. Niobates; B2. Dielectric materials

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; NIOBIUM COMPOUNDS; PERMITTIVITY; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ENERGETIC BOMBARDMENT;

SODIUM COMPOUNDS;

EID: 0842330006     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2003.10.035     Document Type: Article

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