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Volumn 151, Issue 1, 2004, Pages

Boron profile narrowing in laser-processed silicon after rapid thermal anneal

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; BORON; CRYSTAL DEFECTS; DIFFUSION IN SOLIDS; LASER APPLICATIONS; LASER PULSES; RAPID THERMAL ANNEALING; REACTION KINETICS; SINGLE CRYSTALS; SURFACES;

EID: 0842290038     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1633764     Document Type: Article
Times cited : (18)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.