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Volumn B, Issue , 2003, Pages 1131-1134
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Improved thermally stable surface and bulk passivation of PECVD SiN X:H using N2 and SiH4
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Author keywords
[No Author keywords available]
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Indexed keywords
EMITTERS;
GAS MIXTURES;
SPECTRAL RESPONSE;
SURFACE PASSIVATION;
COMPOSITION EFFECTS;
CURRENT VOLTAGE CHARACTERISTICS;
GASES;
NITROGEN;
PASSIVATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SURFACE PROPERTIES;
THERMODYNAMIC STABILITY;
SILICON NITRIDE;
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EID: 3142771634
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (5)
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References (12)
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