Record efficiencies above 21% for MIS-contacted diffused junction silicon solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 1997, Pages 283-286

  Metz, Axel ^a   Hezel, Rudolf ^a  

^a INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COST EFFECTIVENESS; ELECTRIC CONTACTS; ELECTRODES; ENERGY EFFICIENCY; MASKS; METALLIZING; MIS DEVICES; PASSIVATION; PLASMA APPLICATIONS; SEMICONDUCTOR JUNCTIONS; SILICON NITRIDE;

METAL INSULATOR SEMICONDUCTOR (MIS) CONTACTS; SILICON SOLAR CELL EMITTERS;

SILICON SOLAR CELLS;

EID: 0031344563     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)