Ion induced nucleation of diamond

Physica Status Solidi (A) Applied Research

Volumn 154, Issue 1, 1996, Pages 141-153

  Sattel, S ^a   Gerber, J ^a   Ehrhardt, H ^a  

^a Universität Kaiserslautern ^*  (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; IONS; NUCLEATION; PLASMA DIAGNOSTICS; PLASMAS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

BIAS VOLTAGE; ION INDUCED NUCLEATION; NUCLEATION DENSITY; PLASMA BEAM SOURCE;

DIAMOND FILMS;

EID: 0030110145     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.2211540112     Document Type: Article

References (31)

1. S. AISENBERG and R. CHABOT, J. appl. Phys. 42, 2953 (1971).
2. G. AMARATUNGA, A. PUTNIS, K. VLAY, and W. MILNE, Appl. Phys. Letters 55, 634 (1989).
3. S. YUGO, T. KIMURA, and T. KANIA, Diamond relat. Mater. 2, 328 (1992).
4. B. R. STONER, G. H. MA, S. D. WOLTER, and J. T. GLASS, Phys. Rev. B 45, 1167 (1992).
5. D. R. MCKENZIE, D. A. MULLER, E. KAVTCHINSKAIA, D. SEGAL, D. J. H. COCKAYNE, G. AMARATUNGA, and R. SILVA, Thin Solid Films 206, 198 (1991).
6. X. JIANG, C.-P. KLAGES, R. ZACHAI, M. HARTWEG, and H.-J. FÜSSER, Appl. Phys. Letters 62, 3438 (1993).
7. J. GERBER, S. SATTEL, K. JUNG, and H. EHRHARDT, Proc. 8th CIMTEC Conf., Florenze 1994. Ed. P. VINCENZINI, Techna Srl, 1995 (p. 125).
8. J. GERBER, M. WEILER, O. SOHR, K. JUNG, and H. EHRHARDT, Diamond relat. Mater. 3, 506 (1994).
9. J. ROBERTSON, Diamond relat. Mater. 3, 361 (1994).
10. M. WEILER, S. SATTEL, K. JUNG, H. EHRHARDT, V. S. VEERASAMY, and J. ROBERTSON, Appl. Phys. Letters 64, 2797 (1994).
11. M. WEILER, S. SATTEL, TH. GIESSEN, K. JUNG, H. EHRHARDT, V. S. VEERASAMY, and J. ROBERTSON, Phys. Rev. B (1995), to be published.
12. H. OECHSNER and B. TOMCIK, Surface Coatings Technol. 47, 1397 (1991).
13. H. EHRHARDT, R. KLEBER, A. KRÜGER, W. DWORSCHAK, K. JUNG, J. MÜHLING, F. ENGELKE, and H. METZ, Diamond relat. Mater. 1, 316 (1992).
14. E. VIETZKE, V. PHILIPPS, K. FLASKAMP, P. KOIDL, and CH. WILD, Surface Coatings Technol. 47, 156 (1991).
15. W. L. HSU, J. Vacuum Sci. Technol. A 6, 3 (1988).
16. M. WEILER, S. SATTEL, K. JUNG, H. EHRHARDT, and V. S. VEERASAMY, Diamond relat. Mater. 3, 608 (1994).
17. S. SATTEL, M. WEILER, T. GIESSEN, K. JUNG, and H. EHRHARDT, see [7] (p. 133).
18. P. FALLON, C. A. DAVIS, V. S. VEERASAMY, J. RIB, W. MILNE, and G. A. J. AMARATUNGA, Phys. Rev. B 48, 4111 (1993).
19. C. WILD and P. KOIDL, Appl. Phys. Letters 51, 1506 (1987).
20. X. JIANG, W. BEYER, and K. REICHELT, J. appl. Phys. 68, 1378 (1990).
21. Y. LIFSHITZ, G. D. LEMPERT, and E. GROSSMAN, Phys. Rev. Letters 72, 2753 (1994).
22. S. SATTEL, M. WEILER, J. GERBER, T. GIESSEN, H. ROTH, M. SCHEIB, K. JUNG, H. EHRHARDT, and J. ROBERTSON, Diamond relat. Mater. 4, 333 (1995).
23. Y. SHIGESATO, R. E. BOEKENHAUER, and B. W. SHELDON, Appl. Phys. Letters 63, 314 (1993).
24. M. KULISCH, B. SOBISCH, M. KUHR, and R. BECKMANN, Diamond relat. Mater. 4, 401 (1995).
25. R. BECKMANN, B. SOBISCH, and W. KULISCH, Diamond relat. Mater. 3, 555 (1994).
26. R. KOHL, C. WILD, N. HERRES, P. KOIDL, B. R. STONER, and J. T. GLASS, Appl. Phys. Letters 63, 1792 (1993).
27. N. E. LEE, G. A. TOMASCH, and J. E. GREENE, Appl. Phys. Letters 65, 3236 (1994).
28. L. A. MILLER, D. K. BRICE, A. K. PRINJA, and S. T. PICRUAX, Phys. Rev. B 49, 16953 (1994).
29. R. YAMADA and K. SONE, J. nuclear Mater. 116, 200 (1983).
30. R. YAMADA, J. nuclear Mater. 145, 359 (1987).
31. J. W. DAVIS, A. A. HAASZ, and P. C. STANGEBY, J. nuclear Mater. 145, 417 (1987).