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Volumn 69, Issue 3-4, 1999, Pages 217-236

Plasma polymer films as adhesion promoting primers for aluminum substrates. Part I: Characterization of films and film/substrate interfaces

Author keywords

Ellipsometry; Hexamethyldisiloxane; Plasma etching; Plasma polymerized films; Reflection absorption infrared spectroscopy; Scanning electron microscopy; Silica like films; X ray photoelectron spectroscopy

Indexed keywords


EID: 0043100837     PISSN: 00218464     EISSN: None     Source Type: Journal    
DOI: 10.1080/00218469908017229     Document Type: Article
Times cited : (11)

References (20)
  • 18
    • 0030782808 scopus 로고    scopus 로고
    • Radeva, E., Vacuum 48, 41 (1997).
    • (1997) Vacuum , vol.48 , pp. 41
    • Radeva, E.1
  • 20
    • 0003631578 scopus 로고
    • Van Nostrand Reinhold, New York
    • Sivaram, S., Chemical Vapor Deposition (Van Nostrand Reinhold, New York, pp. 1-40, 1995).
    • (1995) Chemical Vapor Deposition , pp. 1-40
    • Sivaram, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.