Growth mechanisms and structural properties of microcrystalline silicon films deposited by catalytic CVD

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 178-183

  Niikura, C ^a   Kim, S Y ^b   Drevillon B ^a   Poissant, Y ^a   Roca i Cabarrocas, P ^a   Bouree J E ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b Ajou University   (South Korea)

Author keywords

Chemical vapor deposition (CVD); Ellipsometry; Silicon; Solar cells

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; ELLIPSOMETRY; FILM GROWTH; FOURIER TRANSFORMS; GLASS; OPTIMIZATION; SEMICONDUCTING SILICON; SILANES; SILICON SOLAR CELLS; SUBSTRATES;

DILUTION PROCESSES; MICROCRYSTALLINE SILICON FILMS;

THIN FILMS;

EID: 0035800974     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01246-9     Document Type: Conference Paper

References (14)

1. MRS spring