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Volumn , Issue , 2003, Pages 187-190

Reliability characteristics of 200 GHz fT/285 GHz fMAX SiGe HBTs

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DEGRADATION; ELECTRIC BREAKDOWN; ELECTRIC CHARGE; ELECTRIC CURRENTS; INTEGRATED CIRCUIT LAYOUT; INTERFACES (MATERIALS); POLYSILICON; RELIABILITY; SEMICONDUCTING SILICON COMPOUNDS; SINGLE CRYSTALS; THERMAL STRESS;

EID: 0348195872     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (6)
  • 6
    • 0030785233 scopus 로고    scopus 로고
    • Degradation of silicon bipolar junction transistors at high forward current densities
    • Jan
    • M. Carroll, A. Neugroschel, C.T. Sah, "Degradation of Silicon Bipolar Junction Transistors at High Forward Current Densities", IEEE Trans. Electron Devices, vol 44 no. 1, Jan 1997, pp. 110-117
    • (1997) IEEE Trans. Electron Devices , vol.44 , Issue.1 , pp. 110-117
    • Carroll, M.1    Neugroschel, A.2    Sah, C.T.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.