A study of atomic layer deposition and reactive plasma compatibility with mesoporous organosilicate glass films

Materials Research Society Symposium - Proceedings

Volumn 766, Issue , 2003, Pages 89-96

  Todd Ryan, E ^a   Freeman, Melissa ^b   Svedberg, Lynne ^b   Lee, J J ^b   Guenther, Todd ^b   Connor, Jim ^b   Yu, Katie ^b   Sun, Jianing ^c   Gidley, David W ^c  

^a ADVANCED MICRO DEVICES   (United States)

^b MOTOROLA INC   (United States)

^c UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIFFUSION; GLASS; MESOPOROUS MATERIALS; MICROPOROUS MATERIALS; PLASMAS; POROSITY; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC LAYER DEPOSITION; BLANKET FILM; MESOPOROUS FILM; MESOPOROUS ORGANOSILICATE GLASS FILM; POSITRON LIFETIME SPECTROSCOPY; REACTIVE PLASMA;

DIELECTRIC FILMS;

EID: 0346938506     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)

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13. A detailed analysis of the PALS data is in progress for a later publication.