Measurement of sidewall, line and line-edge roughness with scanning probe microscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 726-732

  Walch, K ^a   Meyyappan, A ^a   Muckenhirn, S ^a   Margail, J ^b  

^a Surface/Interface Inc   (United States)

^b CEA LETI   (France)

Author keywords

Critical dimension (CD) metrology; Line roughness: optical wave guides; Line edge roughness; Scanning probe microscope; Sidewall roughness

Indexed keywords

NONDESTRUCTIVE EXAMINATION; OPTICAL WAVEGUIDES; PRODUCTION CONTROL; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

SCANNING PROBE MICROSCOPES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0034757308     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436800     Document Type: Article

References (4)