|
Volumn 340-342, Issue , 2003, Pages 765-768
|
Formation of vacancy-impurity complexes in highly As- and P-doped Si
|
Author keywords
Compensation; Doping; Si; Vacancy
|
Indexed keywords
ANNEALING;
COMPLEXATION;
CRYSTAL DEFECTS;
DOPING (ADDITIVES);
DOPPLER EFFECT;
ELECTRIC CONDUCTIVITY;
ELECTRON IRRADIATION;
MOLECULAR ORIENTATION;
SILICON;
ELECTRICAL COMPENSATION;
POSITRON LIFETIME MEASUREMENTS;
VACANCIES;
CRYSTAL IMPURITIES;
|
EID: 0346055268
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physb.2003.09.117 Document Type: Conference Paper |
Times cited : (7)
|
References (15)
|