Kinetics of electric-field-enhanced crystallization of amorphous silicon in contact with Ni catalyst

Applied Physics Letters

Volumn 81, Issue 27, 2002, Pages 5180-5182

  Kim, Hae Yeol ^a   Kim, Binn ^a   Bae, Jong Uk ^a   Hwang, Kwang Jo ^a   Seo, Hyun Sik ^a   Kim, Chang Dong ^a  

^a LG Display Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; CRYSTALLIZATION; ELECTRIC FIELD EFFECTS; HYDROGENATION; POLYCRYSTALLINE MATERIALS; REACTION KINETICS; THIN FILM TRANSISTORS;

FIELD EFFECT MOBILITY;

AMORPHOUS SILICON;

EID: 0345772099     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1532533     Document Type: Article

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