Metal-induced crystallization of a-Si thin films by non vacuum treatments

Journal of the Electrochemical Society

Volumn 144, Issue 11, 1997, Pages

  Kalkan, A Kaan ^a   Fonash, Stephen J ^a,b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; NICKEL; PALLADIUM; RAMAN SCATTERING; SOLUTIONS; SURFACE TREATMENT; THIN FILMS; VACUUM APPLICATIONS;

METAL INDUCED CRYSTALLIZATION; NONVACUUM TREATMENT; SOLID PHASE CRYSTALLIZATION; ULTRAVIOLET REFLECTANCE; VACUUM DEPOSITION;

CRYSTALLIZATION;

EID: 0031269194     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838074     Document Type: Article

References (8)

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