Influence of high pressure and temperature on defect structure of silicon crystals implanted with N or Si ions

Journal of Alloys and Compounds

Volumn 362, Issue 1-2, 2004, Pages 275-281

  Bak Misiuk, J ^a   Misiuk, A ^b   Paszkowicz, W ^a   Shalimov, A ^a   Hartwig J ^c   Bryja, L ^d   Domagala, J Z ^a   Trela, J ^a   Wierzchowski, W ^b   Wieteska, K ^e   Ratajczak, J ^b   Graeff, W ^f  

^a INSTITUTE OF PHYSICS   (Poland)

^b Department of Optical Fiber Technology and and Quantum Systems   (Poland)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^d WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^e INSTITUTE OF ATOMIC ENERGY   (Poland)

^f DESY   (Germany)

Author keywords

Defect structure; High pressure treatment; Implanted silicon; X ray diffraction

Indexed keywords

AMORPHOUS FILMS; CRYSTAL DEFECTS; CRYSTALS; DISLOCATIONS (CRYSTALS); HIGH PRESSURE EFFECTS; HIGH TEMPERATURE EFFECTS; HYDROSTATIC PRESSURE; INTERFACES (MATERIALS); ION IMPLANTATION; NITROGEN; PHOTOLUMINESCENCE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DEFECT STRUCTURE; ROCKING CURVES;

SILICON;

EID: 0345414730     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(03)00598-X     Document Type: Conference Paper

References (13)

1. Adam L.S., Law M.E., Jones K.S., Dokumanci O., Murthy C.S., Hegde S. J. Appl. Phys. 87:2000;2282.
2. Yang D., Ma X., Fan R., Zhang J., Li L., Que D. Physica B. 273-274:1999;308.
3. Wolf E., Schroeter W., Riemann H., Lux B. Mater. Sci. Eng. B36:1996;209.
4. Wilson I.H. Nucl. Instrum. Methods. 81:1984;331.
5. Margail J. Nucl. Instrum. Methods Phys. Res. B. 74:1993;41.
6. Alhilea T., Zolotoyabko E. J. Cryst. Growth. 198/199:1999;414.
7. Alhilea T., Zolotoyabko E., Härtwig J., Ohler M., Prieur E. J. Appl. Phys. 84:1998;6076.
8. Giri P.K., Raineri V. Phys. Rev. B. 65:2001;012110.
9. Misiuk A., Bak-Misiuk J., Antonova I.V., Popov V.P., Raineri V., Romano-Rodriguez A., Bachouri A., Surma H.B., Ratajczak J., Katcki J., Adamczewska J., Neustroev E.P. Comput. Mater. Sci. 21:2001;515.
10. Misiuk A., Barcz A., Raineri V., Ratajczak J., Bak-Misiuk J., Antonova I.V., Wierzchowski W., Wieteska K. Phys. B. 308-310:2000;317.
11. Misiuk A. Mater. Phys. Mech. 1:2000;119.
12. Holý V., Pietsch U., Baumbach T. High Resolution X-ray Scattering from Thin Films and Multilayers (Springer Tracts in Modern Physics v. 149). 1999;Springer, Berlin.
13. Servidori M., Fabri R. J. Phys. D: Appl. Phys. 26:1993;A22.