High-resolution x-ray diffraction and high-resolution scanning electron microscopy studies of Si-based structures with a buried amorphous layer

Journal of Applied Physics

Volumn 84, Issue 11, 1998, Pages 6076-6082

  Ahilea, T ^a   Zolotoyabko, E ^a   Hartwig J ^b   Ohler, M ^b   Prieur, E ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; COMPUTER SIMULATION; INTERFACES (MATERIALS); MOIRE FRINGES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SYNCHROTRON RADIATION; X RAY DIFFRACTION;

HIGH RESOLUTION SCANNING ELECTRON MICROSCOPY; HIGH RESOLUTION X RAY DIFFRACTION; X RAY TOPOGRAPHY MEASUREMENTS;

SILICON COMPOUNDS;

EID: 0032349718     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368919     Document Type: Article

References (15)

1. I. H. Wilson, Nucl. Instrum. Methods 81, 331 (1984).
2. A. H. van Ommen, Nucl. Instrum. Methods Phys. Res. B 39, 194 (1989).
3. Silicon Nitride and Microelectronics, edited by A. Pebler, in Gmelin Handbook of Inorganic and Organometallic Chemistry, Sec. 5, Part C (Springer, Berlin, 1991).
4. J. Margail, Nucl. Instrum. Methods Phys. Res. B 74, 41 (1993).
5. C. Jaussaud, J. Margail, J. Stoemenos, and M. Bruel, Mater. Res. Soc. Symp. Proc. 100, 17 (1987).
6. E. Prieur, C. Guilhalmenc, J. Härtwig, M. Ohler, A. Garcia, and B. Aspar, J. Appl. Phys. 80, 2113 (1996).
7. E. Zolotoyabko and D. Parais, Nuovo Cimento D 19, 385 (1997).
8. D. Parnis, E. Zolotoyabko, W. D. Kaplan, M. Eizenberg, N. Mosleh, F. Meyer, and C. Schwebel, Thin Solid Films 294, 64 (1997).
9. E. Zolotoyabko, Yu. Finkelstein, M. Blumina, and D. Fekete, Physica B 221, 487 (1996).
10. Yu. Finkelstein, E. Zolotoyabko, M. Blumina, and D. Fekete, J. Appl. Phys. 79, 1869 (1996).
11. N. Mainzer, D. Shilo, E. Zolotoyabko, G. Bahir, A. Sher, K. Cytermann, and R. Brener, J. Appl. Phys. 82, 2869 (1997).
12. E. Zolotoyabko, J. Appl. Crystallogr. 31, 241 (1998).
13. C. R. Wie, Mater. Sci. Eng., R. 13, 1 (1994).
14. E. Zolotoyabko, Thin Solid Films 319, 35 (1998).
15. M. Ohler, E. Prieur, and J. Härtwig, J. Appl. Crystallogr. 29, 568 (1996).