Diffusion of implanted nitrogen in silicon

Journal of Applied Physics

Volumn 87, Issue 5, 2000, Pages 2282-2284

  Adam, Lahir Shaik ^a   Law, Mark E ^a   Jones, Kevin S ^a   Dokumaci, Omer ^b   Murthy, C S ^b   Hegde, Suri ^b  

^a University of Florida   (United States)

^b IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001732079     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372173     Document Type: Article

References (8)

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