Accelerated yield learning in aggressive lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 492-503

  Monahan, K M ^a   Ashkenaz, S ^a   Chen, X ^a   Lord, P ^a   Merrill, M ^a   Quattrini, R ^a   Wiley, J ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; HEURISTIC METHODS; IMAGE ANALYSIS; PROCESS CONTROL; SEMICONDUCTOR DEVICE MODELS; SENSITIVITY ANALYSIS;

AGGRESSIVE LITHOGRAPHY; LITHOGRAPHIC YIELD MODELS;

PHOTOLITHOGRAPHY;

EID: 0033701157     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)