Application of model-based, lithographic process control for cost-effective IC manufacturing at 0.13 μm and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 435-446

  Monahan, Kevin M ^a   Lord, Pat ^a   Hayzelden, Clive ^a   Ng, Waiman ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; INTEGRATED CIRCUIT MANUFACTURE; MICROPROCESSOR CHIPS; PHASE SHIFT; PROCESS CONTROL; SEMICONDUCTOR DEVICE MODELS;

ADVANCED PROCESS CONTROL (APC);

PHOTOLITHOGRAPHY;

EID: 0032628376     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350830     Document Type: Conference Paper

References (8)