Current status of plasma emission electronics: II hardware

Laser and Particle Beams

Volumn 21, Issue 2, 2003, Pages 139-156

  Bugaev, A S ^a   Vizir, A V ^a   Gushenets, V I ^a   Nikolaev, A G ^a   Oks, E M ^a   Yushkov, G Yu ^a   Burachevsky, Yu A ^b   Burdovitsin, V A ^b   Osipov, I V ^b   Rempe, N G ^b  

^a INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

^b SUCSR   (Russian Federation)

Author keywords

Discharge; Electron or ion beam; Electron or ion source; Plasma

Indexed keywords

ANNEALING; ELECTRIC DISCHARGES; ELECTRON BEAM WELDING; ELECTRON BEAMS; ELECTRON TRANSPORT PROPERTIES; ELECTRONICS ENGINEERING; ION BEAMS; ION IMPLANTATION; PLASMA SOURCES; TECHNOLOGICAL FORECASTING;

PLASMA ELECTRONICS; PLASMA EMISSION ELECTRONICS; PLASMOCHEMICAL REACTIONS; SURFACE HEATING;

PLASMA APPLICATIONS;

EID: 0344034234     PISSN: 02630346     EISSN: None     Source Type: Journal    
DOI: 10.1017/S0263034603212039     Document Type: Article

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