Atomic transport across the interfaces during the formation of ultrathin silicon oxide/nitride/oxide films

Applied Physics Letters

Volumn 73, Issue 14, 1998, Pages 1970-1972

  Baumvol, I J R ^a   Salgado, T D M ^a   Radtke, C ^a   Krug, C ^a   De Andrade, J ^a  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343782127     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122338     Document Type: Article

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