Determination of thin film growth mechanisms of deposited metal oxides by a combined use of ISS and XPS

Applied Surface Science

Volumn 141, Issue 1-2, 1999, Pages 186-192

  Jimenez V M ^a   Espinos J P ^a   Gonzalez Elipe A R ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

Author keywords

68.55. a; 82.80.Pv; 82.80.Yc; IM; ISS; Layer formation mechanism; Oxide thin film; PG; Thin film growth; TI; XPS

Indexed keywords

APPROXIMATION THEORY; DEPOSITION; MATHEMATICAL MODELS; OXIDES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION SCATTERING SPECTROSCOPY; LAYER FORMATION MECHANISM;

FILM GROWTH;

EID: 0033099581     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00612-6     Document Type: Article

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