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Volumn 371, Issue 2-3, 1997, Pages 358-370

Selective growth and characterization of pure, epitaxial α-Fe2O3(0001) and Fe3O4(001) films by plasma-assisted molecular beam epitaxy

Author keywords

Electron solid diffraction; Iron oxide; Molecular beam epitaxy; Photoelectron spectroscopy; Single crystal epitaxy

Indexed keywords

ALUMINA; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MAGNESIA; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0031078522     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)00999-5     Document Type: Article
Times cited : (152)

References (40)
  • 17
    • 30244466219 scopus 로고
    • Ph.D. Thesis, Department of Chemistry, University of Hawaii, USA
    • Y.J. Kim, Ph.D. Thesis, Department of Chemistry, University of Hawaii, USA, 1995.
    • (1995)
    • Kim, Y.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.