In situ RHEED and XPS studies of epitaxial thin α-Fe2O3(0001) films on sapphire

Surface Science

Volumn 366, Issue 3, 1996, Pages 579-586

  Fujii, T ^a   Alders, D ^a   Voogt, F C ^a   Hibma, T ^a   Thole, B T ^a   Sawatzky, G A ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

Epitaxy; Iron oxide; Molecular beam epitaxy; Reflection high energy electron diffraction (RHEED); X ray photoelectron spectroscopy (XPS)

Indexed keywords

BINDING ENERGY; FILM GROWTH; FILM PREPARATION; LATTICE CONSTANTS; MOLECULAR BEAM EPITAXY; MONOLAYERS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SHRINKAGE; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

HEMATITES; INTERPLANAR CONTRACTIONS;

IRON OXIDES;

EID: 0030289714     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00844-8     Document Type: Article

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