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Volumn 353, Issue 1, 1999, Pages 113-123

SnO2 thin films prepared by ion beam induced CVD: preparation and characterization by X-ray absorption spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; ION BEAM LITHOGRAPHY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; TEMPERATURE; TIN COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0343091340     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00392-2     Document Type: Article
Times cited : (41)

References (40)
  • 17
    • 84913989583 scopus 로고
    • Structures Fines dÁbsorption des Rayons X in Chimie
    • H. Dexpert, A. Michalowicz, Verdaguer M. Orsay
    • Bonnin D., Kaiser P., Fretigny C., Desbarres J. Structures Fines dÁbsorption des Rayons X in Chimie. Dexpert H., Michalowicz A., Verdaguer M. Logiciels d'analyse EXAFS 3. 1989;Orsay.
    • (1989) Logiciels d'Analyse EXAFS 3
    • Bonnin, D.1    Kaiser, P.2    Fretigny, C.3    Desbarres, J.4
  • 39
    • 0343215394 scopus 로고
    • Characterisation of Semiconductors Materials
    • G.E. McGuire. Mill Road: Noyes Publications
    • Bevolo A.J. Characterisation of Semiconductors Materials. McGuire G.E. Principles and Methods. 1989;147 Noyes Publications, Mill Road.
    • (1989) Principles and Methods , pp. 147
    • Bevolo, A.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.