Calibration of the probing depth by total electron yield of EXAFS spectra in oxide overlayers (Ta2O5, TiO2, ZrO2)

Surface and Interface Analysis

Volumn 25, Issue 9, 1997, Pages 707-714

  Jimenez V M ^a   Caballero, A ^a   Fernandez A ^a   Sanchez Lopez J C ^a   Gonzalez Elipe A R ^a,b   Trigo, J F ^c   Sanz, J M ^c  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b CSIC JA USE Centro de Investigaciones Cientificas Isla de la Cartuja CICIC   (Spain)

^c UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

EXAFS probing depth; Oxides; Total electron yield; X ray absorption spectroscopy

Indexed keywords

ATOMS; ELECTRONS; FOURIER TRANSFORMS; HELIUM; IONS; LIGHT ABSORPTION; OXIDES;

PROBING DEPTH; TOTAL ELECTRON YIELD; X RAY ABSORPTION SPECTROSCOPY;

ABSORPTION SPECTROSCOPY;

EID: 0031213041     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199708)25:9<707::AID-SIA290>3.0.CO;2-E     Document Type: Article

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