Preparation of Al2O3 thin films by ion-beam-induced CVD: Structural effects of the bombardment with accelerated ions

Surface and Coatings Technology

Volumn 80, Issue 1-2, 1996, Pages 23-26

  Caballero, A ^a   Leinen, D ^a   Fernandez A ^a   Gonzalez Elipe A R ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

Author keywords

Chemical vapour deposition; Ion beam deposition; Ion energy; Thin films; X ray absorption spectroscopy

Indexed keywords

ALUMINA; ANNEALING; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; ION BEAMS; ION BOMBARDMENT; MICROSTRUCTURE; OXYGEN; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY SPECTROSCOPY;

COMPACTED GRAINS; ION BEAM DEPOSITION; ION ENERGY; STRUCTURAL EFFECTS; X RAY ABSORPTION SPECTROSCOPY;

THIN FILMS;

EID: 0030106228     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02680-0     Document Type: Article

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