Industrial fabrication method for arbitrarily shaped silicon N-well micromechanical structures

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1998, Pages 240-245

  Muller, T ^a   Feichtinger, T ^a   Breitenbach, G ^a   Brandl, M ^a   Brand, O ^a   Baltes, H ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC CONTACTS; ETCHING; MEMBRANES; MICROELECTROMECHANICAL DEVICES; OSCILLATORS (ELECTRONIC); SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR QUANTUM WELLS; SILICON WAFERS; SUBSTRATES; VIBRATIONS (MECHANICAL);

ELECTROCHEMICAL ETCH STOP; MECHANICAL QUALITY FACTORS;

SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0031704723     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)