-
1
-
-
0001222690
-
-
Fan W Y, Knewstubb P F, Käning M, Mechold L, Röpcke J and Davies P B 1999 J. Phys. Chem. A 103 4118
-
(1999)
J. Phys. Chem. A
, vol.103
, pp. 4118
-
-
Fan, W.Y.1
Knewstubb, P.F.2
Käning, M.3
Mechold, L.4
Röpcke, J.5
Davies, P.B.6
-
2
-
-
0033474404
-
-
Röpcke J, Mechold L, Käning M, Fan W Y and Davies P B 1999 Plasma Chem. Plasma Process. 19 395
-
(1999)
Plasma Chem. Plasma Process.
, vol.19
, pp. 395
-
-
Röpcke, J.1
Mechold, L.2
Käning, M.3
Fan, W.Y.4
Davies, P.B.5
-
3
-
-
0032387645
-
-
Bugaev S P, Kozyrev A V, Kushinov V A, Sochugov N S and Khryapov PA 1998 Plasma Chem. Plasma Process. 18 247
-
(1998)
Plasma Chem. Plasma Process.
, vol.18
, pp. 247
-
-
Bugaev, S.P.1
Kozyrev, A.V.2
Kushinov, V.A.3
Sochugov, N.S.4
Khryapov, P.A.5
-
4
-
-
0039396023
-
-
Hsieh L-T, Lee W-J, Chen C-Y, Chang M-B and Chang H-C 1998 Plasma Chem. Plasma Process. 18 215
-
(1998)
Plasma Chem. Plasma Process.
, vol.18
, pp. 215
-
-
Hsieh, L.-T.1
Lee, W.-J.2
Chen, C.-Y.3
Chang, M.-B.4
Chang, H.-C.5
-
7
-
-
0001943006
-
-
Childs M A, Menningen K L, Chevako P, Spellmeyer N W, Anderson L W and Lawler J E 1992 Phys. Lett. A 171 87
-
(1992)
Phys. Lett. A
, vol.171
, pp. 87
-
-
Childs, M.A.1
Menningen, K.L.2
Chevako, P.3
Spellmeyer, N.W.4
Anderson, L.W.5
Lawler, J.E.6
-
8
-
-
0001633550
-
-
Wahl E H, Owano T G, Kruger C H, Zalicki P, Ma Y and Zare R N 1997 Diamond Related Mater. 6 476
-
(1997)
Diamond Related Mater.
, vol.6
, pp. 476
-
-
Wahl, E.H.1
Owano, T.G.2
Kruger, C.H.3
Zalicki, P.4
Ma, Y.A.5
Zare, R.N.6
-
9
-
-
0001466674
-
-
Zalicki P, Ma Y, Zare R N, Wahl E H, Dadamio J R, Owano T G and Kruger C H 1995 Chem. Phys. Lett. 234 269
-
(1995)
Chem. Phys. Lett.
, vol.234
, pp. 269
-
-
Zalicki, P.1
Ma, Y.2
Zare, R.N.3
Wahl, E.H.4
Dadamio, J.R.5
Owano, T.G.6
Kruger, C.H.7
-
10
-
-
0001620491
-
-
Zalicki P, Ma Y, Zare R N, Wahl E H, Dadamio J R, Owano T G and Kruger C H 1995 Appl. Phys. Lett. 67 144
-
(1995)
Appl. Phys. Lett.
, vol.67
, pp. 144
-
-
Zalicki, P.1
Ma, Y.2
Zare, R.N.3
Wahl, E.H.4
Dadamio, J.R.5
Owano, T.G.6
Kruger, C.H.7
-
11
-
-
0030104299
-
-
Haverlag M, Stoffels E, Stoffels W W, Kroesen G M W and De Hoog F J 1996 J. Vac. Sci. Technol. A 14 380
-
(1996)
J. Vac. Sci. Technol. A
, vol.14
, pp. 380
-
-
Haverlag, M.1
Stoffels, E.2
Stoffels, W.W.3
Kroesen, G.M.W.4
De Hoog, F.J.5
-
14
-
-
21844510712
-
-
Haverlag M, Stoffels E, Stoffels W W, Kroesen G M W and De Hoog F J 1994 J. Vac. Sci. Technol. A 12 3102
-
(1994)
J. Vac. Sci. Technol. A
, vol.12
, pp. 3102
-
-
Haverlag, M.1
Stoffels, E.2
Stoffels, W.W.3
Kroesen, G.M.W.4
De Hoog, F.J.5
-
15
-
-
0030104436
-
-
Haverlag M, Stoffels E, Stoffels W W, Kroesen G M W and De Hoog F J 1996 J. Vac. Sci. Technol. A 14 384
-
(1996)
J. Vac. Sci. Technol. A
, vol.14
, pp. 384
-
-
Haverlag, M.1
Stoffels, E.2
Stoffels, W.W.3
Kroesen, G.M.W.4
De Hoog, F.J.5
-
18
-
-
0027882391
-
-
Naito S, Ikeda M, Ito N, Hattori T and Goto T 1993 Japan. J. Appl. Phys. 32 5721
-
(1993)
Japan. J. Appl. Phys.
, vol.32
, pp. 5721
-
-
Naito, S.1
Ikeda, M.2
Ito, N.3
Hattori, T.4
Goto, T.5
-
19
-
-
0001609782
-
-
Ikeda M, Ito N, Hiramatsu M, Hori M and Goto T 1997 J. Appl. Phys. 82 4055
-
(1997)
J. Appl. Phys.
, vol.82
, pp. 4055
-
-
Ikeda, M.1
Ito, N.2
Hiramatsu, M.3
Hori, M.4
Goto, T.5
-
24
-
-
0028543399
-
-
Rousseau A, Tomasini L, Gousset G, Boisse-Laporte C and Leprince P 1994 J. Phys. D: Appl. Phys. 27 2439
-
(1994)
J. Phys. D: Appl. Phys.
, vol.27
, pp. 2439
-
-
Rousseau, A.1
Tomasini, L.2
Gousset, G.3
Boisse-Laporte, C.4
Leprince, P.5
-
27
-
-
0038150243
-
-
Röpcke J, Mechold L, Käning M, Anders J, Wienhold F G, Nelson D and Zahniser M 2000 Rev. Sci. Instrum. 71 3706
-
(2000)
Rev. Sci. Instrum.
, vol.71
, pp. 3706
-
-
Röpcke, J.1
Mechold, L.2
Käning, M.3
Anders, J.4
Wienhold, F.G.5
Nelson, D.6
Zahniser, M.7
|