SCOPUS 정보 검색 플랫폼

Polymer

Volumn 41, Issue 17, 2000, Pages 6691-6694

A novel organic bottom anti-reflective coating material for 193 nm excimer laser lithography

(3) Hwang, S H a Lee, K K b Jung, J C c

a Korea Institute of Industrial Technology (South Korea)

b Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

c Hynix Semiconductor Inc (South Korea)

Author keywords

Lithography; Poly(3,3' dimethylpropene); Thermal acid generator

Indexed keywords

CROSSLINKING; EXCIMER LASERS; LIGHT ABSORPTION; PHENOLIC RESINS; PHOTORESISTS; PLASTIC COATINGS; POLYOLEFINS; SUBSTRATES; SULFUR COMPOUNDS; ULTRAVIOLET RADIATION;

POLYDIMETHYLPROPENE; POLYVINYLPHENOL; THERMAL ACID GENERATORS;

ANTIREFLECTION COATINGS;

ACROLEIN; PHENOL DERIVATIVE; POLYVINYL DERIVATIVE; PROPYLENE; PROTECTIVE AGENT; SULFONIC ACID DERIVATIVE; TOLUENE DERIVATIVE;

ARTICLE; CHEMICAL REACTION; CHEMICAL STRUCTURE; CONTROLLED STUDY; CROSS LINKING; EXCIMER LASER; LIGHT ABSORPTION; PERFORMANCE; SYNTHESIS;

EID: 0342804539 PISSN: 00323861 EISSN: None Source Type: Journal
DOI: 10.1016/S0032-3861(00)00010-0 Document Type: Article

Times cited : (16)

References (13)

1
- 0000697586
- Jung J.C., Bok C.K., Baik K.H. J Photopolym Sci Technol. 10:1997;529.
- (1997) J Photopolym Sci Technol , vol.10 , pp. 529
- Jung, J.C.¹ Bok, C.K.² Baik, K.H.³

2
- 0343293171
- Hwang S.H., Jung J.C. Polym Int. 10:1999;529.
- (1999) Polym Int , vol.10 , pp. 529
- Hwang, S.H.¹ Jung, J.C.²

3
- 0006887289
- Okoroanyanwu U., Byers J., Shimokawa T., Willson C.G. Chem Mater. 10:1998;3328.
- (1998) Chem Mater , vol.10 , pp. 3328
- Okoroanyanwu, U.¹ Byers, J.² Shimokawa, T.³ Willson, C.G.⁴

4
- 0000363715
- Okoroanyanwu U., Shimokawa T., Byers J., Willson C.G. Chem Mater. 10:1998;3319.
- (1998) Chem Mater , vol.10 , pp. 3319
- Okoroanyanwu, U.¹ Shimokawa, T.² Byers, J.³ Willson, C.G.⁴

5
- 0031345931
- Ogawa T., Uematsu M., Onodera T., Nakazawa K., Takahashi M., Ohfuji T., Ohtsuka H., Sasago M. Jpn J Appl Phys. 36:1997;7482.
- (1997) Jpn J Appl Phys , vol.36 , pp. 7482
- Ogawa, T.¹ Uematsu, M.² Onodera, T.³ Nakazawa, K.⁴ Takahashi, M.⁵ Ohfuji, T.⁶ Ohtsuka, H.⁷ Sasago, M.⁸

6
- 85076469998
- Ogawa T., Nakano H., Gocho T., Tsumori T. Proc SPIE. 2197:1994;722.
- (1994) Proc SPIE , vol.2197 , pp. 722
- Ogawa, T.¹ Nakano, H.² Gocho, T.³ Tsumori, T.⁴

7
- 0001556956
- Ogawa T., Sekiguchi A., Yoshizawa N. Jpn J Appl Phys. 35:1996;6360.
- (1996) Jpn J Appl Phys , vol.35 , pp. 6360
- Ogawa, T.¹ Sekiguchi, A.² Yoshizawa, N.³

8
- 0031071844
- Schiltz A., Terpan J.F., Amblard G., Paniez P.J. Microelectronic Engng. 35:1997;221.
- (1997) Microelectronic Engng , vol.35 , pp. 221
- Schiltz, A.¹ Terpan, J.F.² Amblard, G.³ Paniez, P.J.⁴

9
- 0031189944
- Jun B.H., Han S.S., Lee J.S., Kim Y.B., Kang H.Y., Koh Y.B., Jiang Z.T., Bae B.S., No K. Semicond Sci Technol. 12:1997;921.
- (1997) Semicond Sci Technol , vol.12 , pp. 921
- Jun, B.H.¹ Han, S.S.² Lee, J.S.³ Kim, Y.B.⁴ Kang, H.Y.⁵ Koh, Y.B.⁶ Jiang, Z.T.⁷ Bae, B.S.⁸ No, K.⁹

10
- 0007088118
- Sohn J.M., Kim B.G., Choi S.W., Kim J.M., Cha B.C., Yoon H.S. Jpn J Appl Phys. 37:1998;6669.
- (1998) Jpn J Appl Phys , vol.37 , pp. 6669
- Sohn, J.M.¹ Kim, B.G.² Choi, S.W.³ Kim, J.M.⁴ Cha, B.C.⁵ Yoon, H.S.⁶

11
- 0010478597
- Yan P., Qian Q., Langston J. Proc SPIE. 1972:1993;167.
- (1993) Proc SPIE , vol.1972 , pp. 167
- Yan, P.¹ Qian, Q.² Langston, J.³

12
- 0026821020
- Yen A., Smith H.I., Schattenburg M.L., Taylor G.N. J Electrochem Soc. 139:1992;616.
- (1992) J Electrochem Soc , vol.139 , pp. 616
- Yen, A.¹ Smith, H.I.² Schattenburg, M.L.³ Taylor, G.N.⁴

13
- 85045186739
- Kunz R.R., Allen R.D. Proc SPIE. 2195:1994;447.
- (1994) Proc SPIE , vol.2195 , pp. 447
- Kunz, R.R.¹ Allen, R.D.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.